Microwave Plasma Enhanced Chemical Vapor Deposited Thin Film Diamond
Journal Title: American journal of Engineering Research - Year 2018, Vol 7, Issue 5
Abstract
Diamond is a unique material with robust mechanical properties, the electrical and the optical properties of the thin film diamond can be altered as they are deposited using microwave plasma enhanced chemical vapor deposition (MPCVD) method. The thin film diamond can be used both as optical window for certain wavelengths of light and as a reflector, based on the thickness and the deposition parameters of the thin film diamond. In this paper, we are illustrating a 1 µm thin film diamond that we were able to deposit, pattern and etch selectively using standard microfabrication techniques. This patterning of diamond film allows us to create 3D structures using single crystal diamond.
Authors and Affiliations
Mohammad Abdul Razak, Andsheikh Irfan Samad
Keywords
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